“Plasma-Aided Manufacturing for Microelectronics”
“Plasma processes can generate films. However, these films often require much higher pressures and different techniques than are used in high-density plasma chambers. Fore example, researchers at QQC Laboratories (Dearborn, Michigan) and Pennsylvania State University (University Park) use a combination of excimer, Nd. YAG, and CO2 lasers to ignite a plasma consisting of nitrogen and carbon dioxide at atmospheric pressure. This technique results in the deposition of high-quality diamond film. Such films can be laid on a metal substrate.”